An x-ray source for producing a uniformly intense area x-ray beam. The x-ray source includes a vacuum chamber. An area electron emitter is disposed at a first end of the vacuum chamber. A target material is disposed at a second end of the vacuum chamber and spaced apart from the area electron... Show moreAn x-ray source for producing a uniformly intense area x-ray beam. The x-ray source includes a vacuum chamber. An area electron emitter is disposed at a first end of the vacuum chamber. A target material is disposed at a second end of the vacuum chamber and spaced apart from the area electron emitter. The area electron emitter and the target material are correspondingly shaped and/or correspondingly curved. The x-ray source also includes at least one high voltage power source. The area electron emitter is electrically connected to a negative pole of one of the at least one high voltage power source and the target electrically connected to a positive pole of one of the at least one high voltage power source.
Sponsorship: Illinois Institute of Technology
United States Patent Show less
