
<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:title>Device and Method for Producing a Spatially Uniformly Intense Source of X-Rays</dc:title>
  <dc:creator>Morrison, Timothy I.</dc:creator>
  <dc:creator>Nesch, Ivan</dc:creator>
  <dc:creator>Khelashvili, Gocha</dc:creator>
  <dc:description>An x-ray source for producing a uniformly intense area x-ray beam. The x-ray source includes a vacuum chamber. An area electron emitter is disposed at a first end of the vacuum chamber. A target material is disposed at a second end of the vacuum chamber and spaced apart from the area electron emitter. The area electron emitter and the target material are correspondingly shaped and/or correspondingly curved. The x-ray source also includes at least one high voltage power source. The area electron emitter is electrically connected to a negative pole of one of the at least one high voltage power source and the target electrically connected to a positive pole of one of the at least one high voltage power source.</dc:description>
  <dc:description>Sponsorship: Illinois Institute of Technology</dc:description>
  <dc:description>United States Patent</dc:description>
  <dc:date>2009-05-19</dc:date>
  <dc:date>2007-10-09</dc:date>
  <dc:type>Patent</dc:type>
  <dc:format>application/pdf</dc:format>
  <dc:identifier>islandora:9819</dc:identifier>
  <dc:identifier>7,280,636</dc:identifier>
  <dc:identifier>http://hdl.handle.net/10560/2656</dc:identifier>
  <dc:language>en</dc:language>
  <dc:rights>No Copyright - United States</dc:rights>
  <dc:rights>http://rightsstatements.org/page/NoC-US/1.0/</dc:rights>
  <dc:rights>Open Access</dc:rights>
</oai_dc:dc>
