
<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:title>Hafnium Base Alloy (Boron)</dc:title>
  <dc:creator>Hill, Vernon L.</dc:creator>
  <dc:creator>Nichols, Harry R.</dc:creator>
  <dc:description>Hafnium tantalum alloy containing about 15 and about 35 weight percent tantalum, between about 0.03 and about 2.0 weight percent boron, and at least one additional alloying agent selected from chromium, silicon and aluminum.</dc:description>
  <dc:description>Sponsorship: IIT Research Institute</dc:description>
  <dc:description>United States Patent</dc:description>
  <dc:date>2009-04-27</dc:date>
  <dc:date>1971-11-23</dc:date>
  <dc:type>Patent</dc:type>
  <dc:format>application/pdf</dc:format>
  <dc:identifier>islandora:9651</dc:identifier>
  <dc:identifier>3,622,309</dc:identifier>
  <dc:identifier>http://hdl.handle.net/10560/2202</dc:identifier>
  <dc:language>en</dc:language>
  <dc:rights>No Copyright - United States</dc:rights>
  <dc:rights>http://rightsstatements.org/page/NoC-US/1.0/</dc:rights>
  <dc:rights>Open Access</dc:rights>
</oai_dc:dc>