
<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:title>Hafnium Base Alloy (Iridium)</dc:title>
  <dc:creator>Hill, Vernon L.</dc:creator>
  <dc:creator>Nichols, Harry R.</dc:creator>
  <dc:description>Hafnium base alloy containing between about 15 and about 35 weight percent tantalum and between about 2 and about 20 weight percent iridium. The alloy may also contain aluminum, silicon or chromium as additional alloying agents.</dc:description>
  <dc:description>Sponsorship: IIT Research Institute</dc:description>
  <dc:description>United States Patent</dc:description>
  <dc:date>2009-04-27</dc:date>
  <dc:date>1971-11-23</dc:date>
  <dc:type>Patent</dc:type>
  <dc:format>application/pdf</dc:format>
  <dc:identifier>islandora:9650</dc:identifier>
  <dc:identifier>3,622,308</dc:identifier>
  <dc:identifier>http://hdl.handle.net/10560/2201</dc:identifier>
  <dc:language>en</dc:language>
  <dc:rights>No Copyright - United States</dc:rights>
  <dc:rights>http://rightsstatements.org/page/NoC-US/1.0/</dc:rights>
  <dc:rights>Open Access</dc:rights>
</oai_dc:dc>